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P Type , Ga-Doped Single Crystal Germanium(Ge) Wafer , 3”

XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.
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P Type , Ga-Doped Single Crystal Germanium(Ge) Wafer , 3”

Brand Name : PAM-XIAMEN

Place of Origin : China

MOQ : 1-10,000pcs

Payment Terms : T/T

Supply Ability : 10,000 wafers/month

Delivery Time : 5-50 working days

Packaging Details : Packaged in a class 100 clean room environment, in single container, under a nitrogen atmosphere

product name : single crystal Ge wafer

Wafer Diamter : 3 inch

Conduction Type : P Type

Thickness : 200~550um

Epi ready : Yes

application : opto-electronics industry

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P Type , Ga-Doped Single Crystal Germanium(Ge) Wafer , 3”

PAM-XIAMEN is a worldwide manufacturer of single crystal Germanium wafer ( Ge wafer ) and single crystal Ge ingot , we have a strong advantage in providing Ge wafer for micro-electronics and opto-electronics industry in diameter range from 2 inch to 6 inch . Germanium wafer is an elemental and popular semiconductor material, due to its excellent crystallographic properties and unique electric properties, Germanium wafer is widely used in Sensor, Solar cell and Infrared optics applications. PAM-XIAMEN can provide low dislocation and epi ready Germanium wafers to meet your unique germanium needs. Germanium wafer is produced as per SEMI. standard and packed in standard cassette with vacuum sealed in clean room environment , with a good quality control system , PAM-XIAMEN is dedicated to providing clean and high quality Germanium wafer products. PAM-XIAMEN can offer both electronics grade and IR grade Ge wafer, please contact us for more Ge product information

Grades And Application Of Germanium Wafer

Electronic Grade Used for diodes and transistors,
Infrared or opitical Grade Used for IR optical window or disks,opitical components
Cell Grade Used for substrates of solar cell

Specification of Germanium Wafer

Item Specifications Remarks
Growth Method VGF
Conduction Type p type
Dopant Gallium
Wafer Diamter 3 inch
Crystal Orientation (100),(111),(110)
Thickness 200~550 um
OF EJ or US
Carrier Concentration request upon customers
Resistivity at RT (0.001~80) Ohm.cm
Etch Pit Density <5000 /cm2
Laser Marking upon request
Surface Finish P/E or P/P
Epi ready Yes
Package Single wafer container or cassette

Germanium Wafer Process

In the germanium wafer production process, germanium dioxide from the residue processing is further purified in chlorination and hydrolysis steps.

1) High purity germanium is obtained during zone refining.

2) A germanium crystal is produced via the Czochralski process.

3) The germanium wafer is manufactured via several cutting, grinding, and etching steps.

4) The wafers are cleaned and inspection. During this process, the wafers are single side polished or double side polished according to custom requirement, epi-ready wafer comes.

5) The wafers are packed in single wafer containers, under a nitrogen atmosphere.

Application:

Germanium blank or window are used in night vision and thermographic imaging solutions for commercial security, fire fighting and industrial monitoring equipment. Also, they are used as filters for analytical and measuring equipment, windows for remote temperature measurement, and mirrors for lasers.

Thin Germanium substrates are used in III-V triple-junction solar cells and for power Concentrated PV (CPV) systems

Are You Looking for Ge Wafer?

No matter the project or usage, we feature some of good quality germanium in our germanium wafers. Enquiry today to learn more about how we can get you germanium wafers for your next project.


Product Tags:

semiconductor silicon wafer

      

ge wafer

      
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